Исследование взаимодействия оксида бора с поверхностью Si (III) методом дифракции быстрых электронов
Диссертация
Одной из основных причин, сдерживающих развитие в нанотехнологии на основе З|3 является проблема получения эпитаксиальных слоев в широком диапазоне уровней легирования (1013-г-1021см" 3}, с полной электрической активацией примеси и без ущерба кристаллического качества. Первоначально, при выборе легирующей примеси в бьМЛЭ руководствовались не низкой энергией ионизации, высокой растворимостью… Читать ещё >
Содержание
- ГЛАВА 1. Использование соединений бора для получения эпитаксиальных слоев кремния р-типа и формирования поверхностных фаз В/Эк
- 1. 1. Выращивание эпитаксиальных слоев кремния р-типа
- 1. 1. 1. Газообразные соединения бора: диборан (В2Н6), декаборан (ВюНм)
- 1. 1. 2. Твердые соединения бора: оксид бора (В203)и метаборная кислота (НВ02)
- 1. 1. 3. Влияние температуры роста на распределение бора в эпитаксиальных слоях кремния
- 1. 2. Структура и методы формирования поверхностной фазы 8|(111)^Зх^ЗР30°-В
- 1. 2. 1. Методы формирования поверхностной фазы 81(111)>/Зхл/ЗРЗО°-В
- 1. 2. 2. Структура поверхностной фазы 81(11 1) а/ЗхУзР30°-В
- 1. 3. Выводы
- 1. 1. Выращивание эпитаксиальных слоев кремния р-типа
- ГЛАВА 2. Экспериментальное оборудование и методики исследования
- 2. 1. Дифракция быстрых электронов на отражение (ДБЭ)
- 2. 1. 1. Основы метода
- 2. 1. 2. Применение метода ДБЭ для исследования структуры поверхности
- 2. 1. 3. Применение ДБЭ для исследования процессов на поверхности
- 2. 2. Экспериментальная установка
- 2. 3. Получение атомарно-чистой поверхности
- 2. 4. Контроль температуры поверхности
- 2. 5. Осаждение кремния и контроль толщины эпитаксиального слоя кремния
- 2. 6. Осаждение оксида бора
- 2. 7. Методика измерения интенсивности зеркального рефлекса ДБЭ
- 2. 8. Выводы
- 2. 1. Дифракция быстрых электронов на отражение (ДБЭ)
- ГЛАВА 3. Адсорбция бора на поверхности 31(111) при ее облучении потоком В
- 3. 1. Влияние облучения потоком В203 на структуру поверхности 3|'(111)
- 3. 2. Температурная зависимость адсорбции бора на поверхности в1(111)-7х
- 3. 3. Механизм взаимодействия В203 с поверхностью 31(111)
- 3. 4. Влияние потока В203 на процесс адсорбции бора
- 3. 5. Исследование процесса релаксации поверхности при прерывании потока В
- 3. 6. Соосаждение В203 и в!
- 3. 7. Выводы
- ГЛАВА 4. Эволюция системы В/в1(111) от времени осаждения В
- 4. 1. Формирование структуры л’Зхл/З при взаимодействии В203 с поверхностью Э1(111)
- 4. 2. Сравнение расчетных кривых качания с экспериментальными кривыми качания
- 4. 3. Влияние осаждения В203 на шероховатость поверхности 31(111)
- 4. 4. Выводы
- ГЛАВА 5. Эпитаксия кремния на поверхности 11) Узх3-Р30°-В
- 5. 1. Влияние адсорбированного бора на механизм роста
- 5. 2. Влияние количества адсорбированного В на качество эпитаксиальных слоев
- 5. 3. Выводы
- Основные результаты работы и
- выводы
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